IPU can offer chemical characterization of materials and surfaces with Glow Discharge optical Emission Spectroscopy (GD-OES). This method gives advantages, as the following:
Both of surfaces and bulk can be analyzed with depth profiles
The method can analyze 43 elements at same time, including hydrogen, carbon, oxygen, sulfur, chloride, and also all metals
Analyzing is fast (1-10 micronmeters per minute)
Possible to analyze relatively thick layer up to 0,15 mm
All conductive materials can be analyzed
GD-OES analysis is conducted by RF-sputtering of surface with argon. These free atoms are excited with waves of characteristic wavelength. The emission spectroscopy identifies each element. This instrument covers broad spectrum from 110 to 620 nm, enabling analysis of light elements such as hydrogen, which is only one present in Denmark.
This drawing shows principle of RF-sputtering of materials and emission spectroscopy. The top image shows a crater formed after RF-sputtering.
This is an example of GD-OES depth profile and optical microscope image of an aluminum sample with multilayer coatings of silver, nickel and copper.
Senior Engineer, Advanced Materials and Surface Technology M.Sc., Ph.D.